Plasma Etching: Fundamentals and Applications: Fundamentals and a Iipplications (Series on Semiconductor Science and Technology) Book + PRICE WATCH * Amazon pricing is not included in price watch

Plasma Etching: Fundamentals and Applications: Fundamentals and a Iipplications (Series on Semiconductor Science and Technology) Book

Plasma Etching : Hardback : Oxford University Press : 9780198562870 : 019856287X : 30 Jul 1998 : The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.Read More

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  • Product Description

    This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

  • 019856287X
  • 9780198562870
  • M. Sugawara
  • 28 May 1998
  • OUP Oxford
  • Hardcover (Book)
  • 362
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